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{ "item_title" : "Advances in X-Ray Analysis", "item_author" : [" C. S. Barrett", "M. Amara", "Ting C. Huang "], "item_description" : "The 39th Annual Denver X-Ray Conference on Applications of X-Ray Analysis was held July 30 -August 3, 1990, at the Sheraton Steamboat Resort and Conference Center, Steamboat Springs, Colorado. The Denver Conference is recognized to be a major event in the x-ray analysis field, bringing together scientists and engineers from around the world to discuss the state of the art in x-ray applications as well as indications for future develop- ments. In recent years there has been a steady expansion of applications of x-ray analysis to characterize surfaces and thin films. To introduce the audience to one of the exciting and important new developments in x-ray fluorescence, the topic for the Plenary Session of the 1990 Conference was: Surface and Near-Surface X-Ray Spectroscopy. The Conference had the privilege of inviting five leading world experts in the field of x-ray spectroscopy to deliver lectures at the Plenary Session. The first two lectures were on total-reflection x-ray fluorescence spectrometry. Professor P. Wobrauschek of Austria reviewed Recent Developments and Results in Total-Reflection X-Ray Fluorescence. Trends and applications of the technique were also discussed. Dr. T. Arai of Japan reported on Surface and Near-Surface Analysis of Silicon Wafers by Total Reflection X-Ray Fluorescence. He emphasized the importance of using proper x-ray optics to achieve high signal-to-noise ratios. A mathematical model relating the x-ray intensity to the depth of x-ray penetration was also described.", "item_img_path" : "https://covers1.booksamillion.com/covers/bam/1/46/136/667/1461366674_b.jpg", "price_data" : { "retail_price" : "54.99", "online_price" : "54.99", "our_price" : "54.99", "club_price" : "54.99", "savings_pct" : "0", "savings_amt" : "0.00", "club_savings_pct" : "0", "club_savings_amt" : "0.00", "discount_pct" : "10", "store_price" : "" } }
Advances in X-Ray Analysis|C. S. Barrett

Advances in X-Ray Analysis

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Overview

The 39th Annual Denver X-Ray Conference on Applications of X-Ray Analysis was held July 30 -August 3, 1990, at the Sheraton Steamboat Resort and Conference Center, Steamboat Springs, Colorado. The "Denver Conference" is recognized to be a major event in the x-ray analysis field, bringing together scientists and engineers from around the world to discuss the state of the art in x-ray applications as well as indications for future develop- ments. In recent years there has been a steady expansion of applications of x-ray analysis to characterize surfaces and thin films. To introduce the audience to one of the exciting and important new developments in x-ray fluorescence, the topic for the Plenary Session of the 1990 Conference was: "Surface and Near-Surface X-Ray Spectroscopy. " The Conference had the privilege of inviting five leading world experts in the field of x-ray spectroscopy to deliver lectures at the Plenary Session. The first two lectures were on total-reflection x-ray fluorescence spectrometry. Professor P. Wobrauschek of Austria reviewed "Recent Developments and Results in Total-Reflection X-Ray Fluorescence. " Trends and applications of the technique were also discussed. Dr. T. Arai of Japan reported on "Surface and Near-Surface Analysis of Silicon Wafers by Total Reflection X-Ray Fluorescence. " He emphasized the importance of using proper x-ray optics to achieve high signal-to-noise ratios. A mathematical model relating the x-ray intensity to the depth of x-ray penetration was also described.

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Details

  • ISBN-13: 9781461366676
  • ISBN-10: 1461366674
  • Publisher: Springer
  • Publish Date: February 2013
  • Dimensions: 10 x 7 x 1.53 inches
  • Shipping Weight: 2.88 pounds
  • Page Count: 743

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