{
"item_title" : "Atomic Layer Deposition 2e",
"item_author" : [" Cameron", "Kääriäinen "],
"item_description" : "Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.",
"item_img_path" : "https://covers2.booksamillion.com/covers/bam/1/11/806/277/1118062779_b.jpg",
"price_data" : {
"retail_price" : "226.95", "online_price" : "226.95", "our_price" : "226.95", "club_price" : "226.95", "savings_pct" : "0", "savings_amt" : "0.00", "club_savings_pct" : "0", "club_savings_amt" : "0.00", "discount_pct" : "10", "store_price" : ""
}
}
Overview
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
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Details
- ISBN-13: 9781118062777
- ISBN-10: 1118062779
- Publisher: John Wiley & Sons
- Publish Date: May 2013
- Dimensions: 9.3 x 6.1 x 0.9 inches
- Shipping Weight: 1.25 pounds
- Page Count: 272
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