{ "item_title" : "Feature Profile Evolution in Plasma Processing Using On-Wafer Monitoring System", "item_author" : [" Seiji Samukawa "], "item_description" : "Introduction.- Background.- On-wafer monitoring technique.- On-wafer UV sensor and prediction of UV irradiation damage.- Introduction.- Prediction system for UV spectrum.- Prediction system for UV-radiation damage in dielectric films.- Prediction of Abnormal Etching Profile in High-Aspect-Ratio Via/Hole Etching Using On-Wafer Monitoring System.- Introduction.- Ion-trajectory prediction.- Twisting prediction.- Feature Profile Evolution in Plasma Processing using Wireless On-wafer Monitoring System.- Introduction.- Experimental Results and Discussion.- Conclusions.", "item_img_path" : "https://covers2.booksamillion.com/covers/bam/4/43/154/794/4431547940_b.jpg", "price_data" : { "retail_price" : "54.99", "online_price" : "54.99", "our_price" : "54.99", "club_price" : "54.99", "savings_pct" : "0", "savings_amt" : "0.00", "club_savings_pct" : "0", "club_savings_amt" : "0.00", "discount_pct" : "10", "store_price" : "" } }

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