{
"item_title" : "Plasma Etching",
"item_author" : [" M. Sugawara", "Barry L. Stansfield", "S. Handa "],
"item_description" : "This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.",
"item_img_path" : "https://covers3.booksamillion.com/covers/bam/0/19/856/287/019856287X_b.jpg",
"price_data" : {
"retail_price" : "270.00", "online_price" : "270.00", "our_price" : "270.00", "club_price" : "270.00", "savings_pct" : "0", "savings_amt" : "0.00", "club_savings_pct" : "0", "club_savings_amt" : "0.00", "discount_pct" : "10", "store_price" : ""
}
}
Plasma Etching : Fundamentals and Applications
Overview
This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.
This item is Non-Returnable
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Details
- ISBN-13: 9780198562870
- ISBN-10: 019856287X
- Publisher: Oxford University Press
- Publish Date: July 1998
- Dimensions: 9.21 x 6.14 x 0.81 inches
- Shipping Weight: 1.5 pounds
- Page Count: 356
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